Project description

Optical scatterometry has been demonstrated a powerful tool to examine the size and location of patterned features on semiconductor materials. By analyzing the scattered light from the tiny structures on sample surface, the geometry of the lithographically created structures can be inferred. Our work will focus on the recognization of nano-scale patterns with supercontinuum light source generated from photonic crystal fiber. Both theoretical and experimental study should be involved in this work. The theoretical work will focus on the relationship between the scattered spectrum and the parameters of the incident beam which include angle, wavelength and polarization of the incident light. Based on theoretical understand, some preliminary experiments should be designed to demonstrate the possibility of using supper continuum light source in scatterometry.