Publications
2008 & before
Journal Articles
· M. J. Kumar, V. Venkataraman and S. K. Gupta, "A New Grounded Lamination Gate (GLG) for Diminished Fringe Capacitance Effects in High-K Gate Dielectric MOSFETs", IEEE Transactions on Electron Devices, vol. 53, no. 10, pp: 2578-2581, October 2006.
· M. J. Kumar, S. K. Gupta and V. Venkataraman, “Compact Modeling of the Effects of Parasitic Internal Fringe Capacitance on the Threshold Voltage of High-K Gate Dielectric Nanoscale SOI MOSFETs”, IEEE Transactions on Electron Devices, vol. 53, no. 4, pp: 706-711, April 2006.
· V. Venkataraman, S. K. Gupta and M. J. Kumar, "On the Parasitic Gate Capacitance of Small Geometry MOSFETs," IEEE Transactions on Electron Devices, vol. 52, no. 7, pp: 1676-1677, July 2005.
Conference Proceedings
· M. J. Kumar, V. Venkataraman and S. K. Gupta, "A New Grounded Lamination Gate (GLG) SOI MOSFET for Diminished Fringe Capacitance Effects," Technical Proceedings of the 2006 NSTI Nanotechnology Conference and Trade Show, pp. 709-712, 2006.
· M. J. Kumar, V. Venkataraman and S. K. Gupta, "Compact Modeling of Parasitic Internal Fringe Capacitance and its effect on the Threshold Voltage of High-K Gate Dielectric SOI MOSFETs", Int. Workshop on the Physics of Semiconductor Devices, 2005.
Book Chapters
· V. Venkataraman, S. K. Gupta and M. J. Kumar, "Laser Processing of Materials in Nanotechnology," Encyclopedia of Nanoscience and Nanotechnology, 2nd Edition, 2008, (Ed. H.S.Nalwa), American Scientific Publishers, CA, USA.